Plasma-Enhanced Chemical Vapor Deposition (PECVD) is a thin-film growth technology that operates at lower temperatures by utilizing plasma. In PECVD, reactive gases are ionized under the influence of plasma, producing ions, electrons, and excited molecules. These active particles migrate to the substrate surface under the influence of an electric field, where they undergo chemical reactions with atoms or molecules on the surface, forming the thin-film material.
Since the film is deposited through gas discharge, analyzing the light spectrum emitted by the plasma can be used to deduce the components present in the plasma. By monitoring the changes in key gas and element components, the deposition process can be inferred, enabling control and monitoring of the reaction process.
1. Experimental Setup
● Sample Chamber: The plasma chamber where the gases to be tested are introduced. By varying the gases or particles introduced into the chamber, parameters like plasma temperature and particle density can be adjusted for plasma monitoring.
● Cosine Corrector: Used to correct for intensity differences and uneven measurement surfaces in data obtained from the plasma chamber.
● UV-Resistant Optical Fiber: Designed to resist aging and high temperatures, preventing damage in the plasma environment.
● Detection Equipment: A UV-visible high-performance fiber optic spectrometer capable of covering the emission or absorption spectra of specific elements or molecules in the plasma.
System Diagram of Optical Fiber Spectrometer for Plasma Measurement
The plasma chamber is made of stainless steel and features a transparent glass window. Argon gas is injected into the chamber using a flow meter, and a high-voltage DC power supply is connected to the chamber's electrode plates to generate glow plasma. After introducing different auxiliary gases into the argon plasma reaction chamber, the plasma properties are altered, and changes in the emission spectra are observed before and after the auxiliary gas is introduced.
Argon Plasma Emission Spectra: (a) Full Spectrum: 10-4500nm (b) UV Spectrum: 10-400nm
2. Applications of PECVD
● Semiconductor Industry: Widely used in various stages for thin-film material deposition, including dielectric layer deposition, low-k dielectric material deposition, and the production of silicon-based optoelectronic devices.
● Solar Cells and Photovoltaics: PECVD's versatility allows for uniform application to broader surfaces, such as solar panels or optical glass. The refractive quality of optical coatings can be finely adjusted by altering the plasma to achieve a high degree of process control.
● Optical Thin Film Preparation: PECVD can produce various optical thin films, such as anti-reflection coatings and reflective coatings, for use in optical instruments, eyeglass lenses, and photometers.
● Biomedical Materials: Used to prepare biocompatible films, bioactive films, and drug release films, with applications in biomedical devices, tissue engineering, and drug delivery. Examples include artificial joints, vascular stents, and cell culture substrates.
3. Product Recommendation
The SR100Q by Jinsp is a research-grade fiber optic spectrometer designed for weak signal detection. It features a cooled array CCD chip with a quantum efficiency of up to 92%, maintaining high responsiveness in the UV range. This spectrometer is ideal for weak signal detection, offering high sensitivity and a high signal-to-noise ratio, coupled with advanced high-resolution optical design, ensuring stable and reliable performance. Please visit: Best SR100Q Ultra High Sensitivity Spectrometer manufacturers and suppliers | JINSP (jinsptech.com)
4. Product Advantages
● High Sensitivity: Capable of detecting extremely low concentrations of elements.
● High Resolution: Able to distinguish closely spaced spectral lines.
● Multi-Element Simultaneous Analysis: Capable of simultaneous measurement of multiple elements.
● Real-Time Monitoring: Able to monitor plasma changes in real time.
Post time: Aug-09-2024